Numerical simulation of thermal stress damage in 1064 nm anti-reflection fused silica by millisecond pulsed laser

作者：Cai, J. X.^*; Guo, M.; Jin, G. Y.

来源：Optik, 2017, 136: 144-150.

DOI：10.1016/j.ijleo.2017.02.019

• Fused silica
• Numerical simulation
• Temperature field
• Stress field

In this paper, we study and establish the theoretical model of thermal stress damage of 1064 nm anti-reflection fused silica, based on which transient distributions of temperature field and thermal stress field are simulated using the finite element method (FEM) and then analyze the mechanism of the damage. The main results show that: there is a cumulative effect in the process of 1064nm anti-reflection fused silica damaged by the laser, its effect is to make the material damage degree increased. The radial temperature gradient is bigger and the axial temperature gradient is smaller in the fused silica internal. In thermal stress damage process which circumferential stress acts a primary role, 1064nm anti-reflection fused silica damaged by the laser often occurs at the action center or the edge near the spot radius.

• 出版日期2017
• 单位长春理工大学