科研之友
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摘要
Nanoimprint lithography is a nano/micro patterning technology to fabricate functional devices by pressing a template with predefined structures on a substrate. Uniformity of the force distribution between the contacting surfaces should be ensured to produce features with high fidelity. In this paper, a parallel alignment device with the abilities of dynamic force distribution control is developed. By adopting a spherical air bearing held with a 5-degree-of-freedom flexure-based stage, wedge errors between the template and the substrate can be eliminated passively without friction when an imprint force is applied. Since the vertical imprint force is mainly supported by the spherical air bearing, the device is very suitable for high force applications, without causing damage to the delicate compliant stage or precision degradation. Besides, the force distribution of the imprint process is measured, based on which dynamic force compensation is performed by actuating the compliant stage actively. Five-hundred-nm-period grating structures are transferred successfully with the device and proofs effectiveness of the device.
- 出版日期2014-3
- 单位北京航空航天大学
