摘要
Feasibility of aluminium deposition on inner wall of pipes by atomic layer deposition was studied by solving kinetics equation of gas adsorption on the pipe inner wall, and the time for the reactant to reach saturated adsorption on the wall was calculated. Furthermore, the process of aluminium deposition by atomic layer deposition was simulated by kinetic Monte Carlo method, and the influence of precursor temperature to the process was analyzed.
- 出版日期2013-11
- 单位兰州空间技术物理研究所