Air-oxidation of nano-multilayered CrAlSiN thin films between 800 and 1000 degrees C

作者：Lee Dong Bok; Nguyen Thuan Dinh; Kim Sun Kyu^*

来源：Surface and Coatings Technology, 2009, 203(9): 1199-1204.

DOI：10.1016/j.surfcoat.2008.10.011

• CrN thin films
• Aluminum
• Silicon
• Oxidation
• Cathodic arc plasma deposition

Multilayered CrAlSiN films consisting of crystalline CrN nanolayers and amorphous AlSiN nanolayers; were deposited by the cathodic arc plasma deposition. The oxidation characteristics of the films were studied at temperature range from 800 and 1000 degrees C for up to 100 h in air. During their oxidation, the amorphous AlSiN nanolayers crystallized. The films displayed good oxidation resistance, owing to the formation of oxide crystallites of Cr2O3, alpha-Al2O3, and amorphous SiO2. The oxidation of the CrAlSiN films occurred via complex routes such as the outward diffusion of Cr, Al and nitrogen and inward transport of oxygen.

• 出版日期2009-1-25