A Chemical Solution Approach to Epitaxial Metal Nitride Thin Films

作者：Luo, Hongmei^*; Lin, Yuan; Wang, Haiyan; Lee, Joon Hwan; Suvorova, Natalya A; Mueller, Alexander H; Burrell, Anthony K; McCleskey, T Mark; Bauer, Eve; Usov, Igor O; Hawley, Marilyn E; Holesinger, Terry G; Jia, Quanxi

来源：Advanced Materials, 2009, 21(2): 193-+.

DOI：10.1002/adma.200801959

Epitaxial metal nitride films are prepared using a general chemical solution approach. A polymer-assisted deposition to prepare epitaxial cubic TiN, metastable AlN, and ternary nitride Ti(1-x)Al(x)N films is demonstrated. The structural, optical and electrical properties of the films are investigated, and may be of interest for many technological applications.

• 出版日期2009-1-12
• 单位Los Alamos; 电子科技大学