Scanning Phase-Mask DUV Inscription of Short-Period Large-Area Photoresist Gratings

作者：Huster Jens^*; Mueller Jost; Renner Hagen; Brinkmeyer Ernst

来源：Journal of Lightwave Technology, 2011, 29(17): 2621-2628.

DOI：10.1109/JLT.2011.2161863

• Bragg gratings
• interferometric lithography
• nanopatterning
• silicon on insulator technology (SOI)
• optical diffraction
• nanochannel array

We present an approach for periodical structuring of large-area photoresist gratings with short periods based on a deep-ultraviolet (DUV) lithography process. Our procedure of inscribing gratings on planar surfaces using a scanning phase-mask interferometer and including a technique for suppressing the disturbing influence of the zeroth-order diffraction is demonstrated and compared to well-established methods. Applying this approach, large-area, centimeter-scale chirped photoresist gratings with a central period of 225 nm, a chirp rate of 0.5 nm/cm and a duty cycle of 50% have been fabricated on planar silicon chips.

• 出版日期2011-9-1