MEASUREMENT OF THE HEIGHT OF NANORELIEF ELEMENTS BY THE METHOD OF THREE-DIMENSIONAL RECONSTRUCTION IN A SCANNING ELECTRON MICROSCOPE

作者：Darznek S A^*; Karabanov D A; Kuzin A Yu; Mityukhlyaev V B; Todua P A; Filippov M N

来源：Measurement Techniques, 2017, 60(3): 220-225.

DOI：10.1007/s11018-017-1177-4

• three-dimensional reconstruction
• scanning electron microscope
• relief structure
• profilometer

Comparative measurements of the height of the nanorelief steps of the surface of a silicon wafer by methods of three-dimensional reconstruction using a scanning electron microscope and profilometry were carried out. To realize the method of three-dimensional reconstruction, an islet gold film is formed on the surface of the test sample. The AlphaStep D-600 profiler is calibrated with a KTS-4500 QS step height gauge. The coincidence of the results of measurements with the methods of three-dimensional reconstruction and profilometry is established. The possibilities of reducing the uncertainty of the measurement results by the method of three-dimensional reconstruction were analyzed.

• 出版日期2017-6