A crystalline hydrogenated carbon film obtained by plasma enhanced chemical vapor deposition

作者:Zhang ZJ*; Narumi K; Naramoto H; Wu ZP; Yamamoto S; Miyashita A; Tamada M
来源:Journal of Applied Physics, 1999, 86(3): 1317-1321.
DOI:10.1063/1.370888

摘要

A hydrogenated carbon film in a crystalline form has been prepared on Si (001) using a radio frequency plasma enhanced chemical vapor deposition process. The crystalline film is metastable and has polymer-like features with a mass density of about 1.20 g/cm(3) and an optical band gap of about 2.75 eV. The stability of the structure and properties of the film was studied by thermal annealing at successively higher temperatures in the air. Upon heating, the film showed a two-step structure change which resulted in a two-step change in the film properties. The relationship between the properties and the bonded hydrogen in the film was also discussed.

  • 出版日期1999-8-1