ADSORPTION OF TITANIUM, CHROMIUM, AND COPPER ATOMS ON THIN ALUMINUM AND MAGNESIUM OXIDE FILM SURFACES

作者：Tvauri I V^*; Turiev A M; Tsidaeva N I; Gazzaeva M E; Vladimirov G G; Magkoev T T

来源：Russian Physics Journal, 2012, 54(11): 1226-1231.

DOI：10.1007/s11182-012-9735-3

• surface
• adsorption
• thin films
• work function
• aluminum oxide
• magnesium oxide
• titanium
• chromium
• copper
• electron spectroscopy

Methods of Auger electron spectroscopy (AES), spectroscopy of characteristic electron energy losses (SCEEL), slow electron diffraction (SED), and contact potential difference (CPD) in ultrahigh vacuum are used to investigate the adsorption-emission properties and stability of two-component film systems formed by putting of Ti, Cr, and Cu atoms on MgO-Mo(011) and Al2O3-Mo(011) surfaces. All atoms have the properties of electronegative adsorbates. Continuous adatom monolayers are formed on the Al2O3-Mo(011) system surface, and three-dimensional islands are formed on the MgO-Mo(011) surface. The properties of monoatomic films on the oxide layer surface are close to those observed for bulk materials. No radical changes of the system properties are detected with increasing dielectric layer thickness. The thermal stability of the newly formed structures decreases in the order Ti, Cr, Cu, Al2O3(MgO), and Mo(011).

• 出版日期2012-4