Antireflection subwavelength structures on fused silica fabricated by colloidal microsphere lithography

作者：Ye, X.; Huang, J.; Li, B.; Geng, F.; Liu, H. J.; Wang, F. R.; Jiang, X. D.^*; Wu, W. D.; Zheng, W. G.

来源：Journal of Optoelectronics and Advanced Materials, 2015, 17(11-12): 1689-1695.

• Antireflection structures
• Colloidal microsphere lithography
• Reactive ion etching

In this paper we present a simple method to fabricate ordered antireflection structures on a fused silica using reactive ion etching and monolayer colloidal microspheres lithography. We show that the period of the obtained silica pillar-like arrays were determined by the initial nanoparticle size. And the height of pillar arrays can be adjusted by controlling the etching time, which are proved to be of importance in tailoring the antireflection properties of antireflection structures surface. For the single side antireflection structures on the fused silica, the reflectance was significantly reduced below 3.5 % over a wide wavelength range of 300-1200nm, while the transmission was improve to 96 %. The structure which has frustum of cone profile exhibited excellent broadband antireflection properties and large angle view properties. However, the size of the antireflection structures affects the antireflective properties in short wavelength region.

• 出版日期2015-12
• 单位上海交通大学; 中国工程物理研究院; 中国工程物理研究院激光聚变研究中心; 西南科技大学