A Novel Method for Patterning of Poly(3,4-ethylenedioxythiophene) Films Using UV Exposure-Activated Self-Assembled Monolayers

作者：Rahman Mohammad Arifur; Kwon Taewook; Lee Young Kyu; Rahim Abdur; Nam Hosoek; Hong Joo Wha; Lee Jong Kwon; Soh Hoesup^*; Lee Jaegab

来源：Journal of Nanoscience and Nanotechnology, 2012, 12(2): 1457-1460.

DOI：10.1166/jnn.2012.4686

• OTS SAMs
• UV-Exposure
• Micro Patterning
• PEDOT

We have investigated a novel method for patterning of (3, 4-ethylenedioxythiophene) PEDOT, which has involved a selective polymerization of PEDOT on an UV-activated Self-Assembled-Monolayer surface. OTS coated surface has been activated by UV exposure, and the UV-exposed area served as adsorption sites for FeCl3 oxidants, providing a selective deposition of PEDOT films on FeCl3 adsorbed area, and thus leading to the selective patterning of PEDOT films. UV irradiation time and mask pattern dimension are main contributors to patternability: UV irradiation through Cr-mask (3 mu m design) lead to approximately 3-5 mu m patterns of PEDOT films, depending on the UV exposure time. In addition, a scotch tape peel test revealed excellent adhesion property of PEDOT to SiO2. Consequently, this simple method can be applied to define deep submicron dimensions due to its ability of providing a direct transfer of mask patterns to the substrate.

• 出版日期2012-2