New Dimethyl(norbornadienyl) platinum(II) Precursors for Platinum MOCVD

作者：Maudez William^*; Roy Christelle; Phong Dinh Tran; Thurier Cyril; Karmous Farah; Doppelt Pascal

来源：Chemical Vapor Deposition, 2014, 20(1-3): 59-68.

DOI：10.1002/CVDE.201307084

• APCVD
• Ti vacancies
• TiO2
• Photocatalyst
• O- defects
• Thermal annealing

Titanium dioxide (TiO2) films are deposited on quartz substrates by atmospheric pressure (AP)CVD, and then annealed under simulated air (80% nitrogen, 20% oxygen) at temperatures from 600 to 900 degrees C to investigate the change in microstructure and the effect on the photocatalytic activity on the simulated pollutant stearic acid. The as-deposited TiO2 film is mainly composed of pure anatase phase while the rutile phase is detected only after annealing the film at 900 degrees C for 1 h. The photocatalytic activity of the annealed films on stearic acid under UV irradiation is found to deteriorate after the films are annealed at temperatures above 700 degrees C. This decrease in photocatalytic performance is observed to be the result of two possible mechanisms induced by the annealing temperature. The first mechanism is the increase in defect concentration (O- and Ti vacancies) in the annealed TiO2 films for annealing temperatures below 800 degrees C, and the second mechanism is the formation of large rutile grains at a higher temperature, 900 degrees C.

• 出版日期2014-3