摘要
We modify the Sigmund model of ion sputtering so that the distribution of deposited energy is in better accord with the results of molecular dynamics simulations. For a flat target surface, the model gives a sputter yield that displays a maximum as the angle of ion incidence is increased, as observed experimentally. The model also predicts that for sufficiently high angles of incidence, the curvature dependence of the crater function tends to destabilize the solid surface.
- 出版日期2014-12-21