摘要
Mn(+)-implanted and annealed Si(1-x)Ge(x) thin films grown on p-Si (100) substrates were formed with the goal of producing (Si(1-x)Ge(x))(1-y)Mn(y) with a high ferromagnetic transition temperature (T(c)). The double-crystal X-ray rocking Curves and transmission electron microscopy images showed that the Mn-implanted and annealed Si(1-x)Ge(x) thin films were single crystalline. The magnetization Curves as functions of the magnetic field clearly showed that ferromagnetism existed in the Mill-implanted and annealed Si(1-x)Ge(x) thin films, and the magnetization Curves as functions of the temperature showed that the T(c) value was above 300 K. These results indicate that the formed (Si(1-x)Ge(x))(1-y)Mn(y) thin films hold promise for potential applications in Si-based spintronic devices operating at room temperature.
- 出版日期2008-8
- 单位武汉大学