Deposition and characterization of Ti-C-x-N-y nanocomposite films by pulsed bias arc ion plating

作者：Zhang, Lin^*; Ma, Guojia; Lin, Guoqiang; Ma, He; Han, Kechang; Liu, Haiyong

来源：Vacuum, 2014, 106: 27-32.

DOI：10.1016/j.vacuum.2014.03.007

• Ti-C-x-N-y films
• Arc ion plating
• Nanocomposite
• Hardness

A series of Ti-C-x-N-y films with different compositions were deposited by pulsed bias arc ion plating. In order to investigate their dependences on compositions, the surface morphology, composition, microstructure, and mechanical properties were assessed by means of scanning electron microscope, X-ray photoelectron spectroscopy, Raman spectroscopy, grazing incident X-ray diffraction, high resolution transmission electron microscopy, and nano-indentation. The results indicated that the as-deposited films were Ti-C-x-N-y nanocomposite films consisting of the nanocrystalline Ti(C,N) embedded in amorphous carbon matrix. A pronounced crystalline phase was observed in the film with high Ti and N contents. The film hardness and elastic modulus decreased with the increase of C/Ti arc current ratio, and a maximum hardness of 37 GPa was obtained with the Ti content of 45.6 at.% and the N content of 38.8 at.%. At high carbon concentration, the films exhibited amorphous structure and more disordered C-C and C-N soft phases were produced with less Ti incorporated into the film.

• 出版日期2014-8
• 单位大连理工大学; 中国航空工业集团公司北京航空制造工程研究所