Double patterning in nanoimprint lithography

作者：Okada Makoto^*; Miyake Hiroto; Iyoshi Shuso; Yukawa Takao; Katase Tetsuya; Tone Katsuhiko; Haruyama Yuichi; Matsui Shinji

来源：Microelectronic Engineering, 2013, 112: 139-142.

DOI：10.1016/j.mee.2013.06.009

• Nanoimprint lithography (NIL)
• Double patterning
• UV nanoimprinting
• Room-temperature nanoimprinting

Nanoimprint lithography (NIL) is a simple fabrication process used to produce nanostructured devices with high resolution, high throughput and at low cost. The resolution of the mold pattern determines the resolution of the imprint pattern obtained. Thus, to improve the resolution of the nanostructures attainable by NIL, new methods are required to produce higher-resolution molds. In photolithography, double patterning significantly enhances the resolution of the nanoscale features. We demonstrate the use of double patterning nanoimprinting using ultraviolet and room-temperature-NIL resin systems. This paves the way toward a much greater variety of higher-resolution NIL products.

• 出版日期2013-12