摘要

In this letter, a traveling-wave single-pole double-throw (SPDT) switch using slow-wave coplanar waveguides is implemented in a 65-nm triple-well CMOS process. For performance improvement, double-well body-floating technique is used. The p-well layer and deep n-well layer of nMOSFET being, respectively, biased to -1.4 and 2.0 V, the measured SPDT exhibits an insertion loss of 2.8 dB and an isolation of 20 dB at 60 GHz. A measured input 1-dB compression point (ICP1dB) of 17 dBm is obtained at 35 GHz (16.3 dBm at 60 GHz by simulation). The total chip size is only 0.42 mm(2) (780 mu m x 540 mu m) including all testing pads.

  • 出版日期2013-9