Process Intensification in Vacuum Arc Deposition Setups

作者：Baranov Oleg^*; Romanov Maxim

来源：Plasma Processes and Polymers, 2009, 6(2): 95-100.

DOI：10.1002/ppap.200800131

• DC discharges
• ion-assisted deposition
• process control
• thin films

The possibility to intensify the deposition process by application of a magnetic field generated by two additional magnetic coils placed under a substrate exposed to vacuum arc plasma has been investigated. When both additional coils generate a magnetic field matched with the field generated by guiding and focusing the coils of a vacuum arc source, the substrate ion current can be increased by up to 4.4% of the arc current, i.e., 1.26 times compared to a system without the additional magnetic field. A monotonous decrease of arc current depending on the currents in both additional coils is observed. When additional coils are powered oppositely and the magnetic field generated by one additional coil is directed according to the magnetic field of coils of the arc source, the substrate ion current can be decreased to 2.7% of the arc current.

• 出版日期2009-2-9