New high fill-factor dual-curvature microlens array fabrication using UV proximity printing

作者：Lin Tsung Hung; Yang Hsiharng^*; Chao Ching Kong; Hung Shih Yu; Hsu Jen Sung

来源：Microsystem Technologies, 2011, 17(4): 601-607.

DOI：10.1007/s00542-011-1282-2

A new high fill-factor dual-curvature microlens array fabrication method using lithographic proximity printing process is reported. The proposed technology utilizes UV proximity printing by controlling a printing gap between the mask and substrate. The designed microlens array pattern with high density can produce a high fill-factor dual-curvature microlens array in photoresist. Because the UV light diffraction deflects away from the aperture edges and produces exposure in photoresist material outside the aperture edges, this method can precisely control the geometric profile of a high fill factor dual-curvature microlens array. The experimental results showed that the dual-curvature micro-lens array can be formed automatically in photoresist when the printing gap ranged from 360 to 600 mu m. The gapless dual-curvature microlens array will be used to enhance the luminance uniformity for light-emitting diodes (LEDs).

• 出版日期2011-4
• 单位南开大学