A novel approach to radiographic image resolution gauge fabrication

作者：Trivelpiece C L^*; Babcox B L; Brenizer J S Jr; Wolfe D E; Adair J H

来源：Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment , 2011, 646(1): 135-141.

DOI：10.1016/j.nima.2011.04.039

• Neutron imaging
• X-ray imaging
• Radiography
• Radiographic
• Rapid-infiltration
• Image resolution
• Image unsharpness

A resolution gauge was fabricated for measuring the spatial resolution of radiographic imaging systems. Silicon wafers, 100 mm <1 0 0>, were patterned using standard contact lithography and the patterned features were etched using deep reactive ion etching (DRIE). The smallest features were 5 mu m wide line pairs. The resulting etched trenches included aspect ratios of up to 10:1 and were 40.6 +/- 0.2 pm deep. The etch rate was 2.7 mu m/min for the reported etch depth. A Gd(2)O(3) nanopowder was dispersed into a slurry using Darvan C and water as the dispersant and solvent, respectively. A rapid infiltration method was used to fill the etched trenches with the slurry. Neutron and X-ray radiographs of the resolution gauge and the results demonstrate that the prototype gauge would be a suitable standard for measuring the spatial resolution of both X-ray and neutron radiography systems.

• 出版日期2011-8-1