Atomic Layer Deposition of Iron Sulfide and Its Application as a Catalyst in the Hydrogenation of Azobenzenes

作者：Shao, Youdong; Guo, Zheng; Li, Hao; Su, Yantao; Wang, Xinwei^*

来源：Angewandte Chemie - International Edition, 2017, 56(12): 3226-3231.

DOI：10.1002/anie.201700449

• atomic layer deposition
• hydrogenation
• iron
• supported catalysts
• thin films

The atomic layer deposition (ALD) of iron sulfide (FeSx) is reported for the first time. The deposition process employs bis(N,N'-di-tert-butylacetamidinato)iron(II) and H2S as the reactants and produces fairly pure, smooth, and well-crystallized FeSx thin films following an ideal self-limiting ALD growth behavior. The FeSx films can be uniformly and conformally deposited into deep narrow trenches with aspect ratios as high as 10:1, which highlights the broad applicability of this ALD process for engineering the surface of complex 3D nanostructures in general. Highly uniform nanoscale FeSx coatings on porous gamma-Al2O3 powder were also prepared. This compound shows excellent catalytic activity and selectivity in the hydrogenation of azo compounds under mild reaction conditions, demonstrating the promise of ALD FeSx as a catalyst for organic reactions.

• 出版日期2017-3-13
• 单位北京大学深圳研究生院