An X-ray photoelectron spectroscopy study of strontium-titanate-based high-k film stacks

作者：Sygellou L; Tielens H; Adelmann C; Ladas S^*

来源：Microelectronic Engineering, 2012, 90: 138-140.

DOI：10.1016/j.mee.2011.03.003

• Strontium titanates
• Thin films
• XPS

Stoichiometric and Sr-rich strontium-titanate (STO) nanofilms grown on thin TiN layers over SiO(2)/Si were studied by X-ray photoelectron spectroscopy (XPS) at two analyzer exit angles, both as-deposited and after rapid thermal annealing (RTA) at 650 degrees C in N(2). Individual layer thickness and composition, mutually dependent via the electron transport properties of the film matrix, were iteratively obtained using a set of empirical relative sensitivity factors (RSF), as well as inelastic mean free paths with their elastic corrections, as per ISO18118:2004(E). Successive layer thicknesses and average Sr/Ti atomic ratios were consistent with the nominal description of the samples, provided a superficial SrCO(3) phase inadvertently formed over STO during growth is taken into account. This phase was strongly reduced upon RTA, with considerable compacting of the STO layers.

• 出版日期2012-2