摘要
Single crystal Zn3N2 films with (100) orientation have been grown by plasma-assisted molecular beam epitaxy on MgO and A-plane sapphire substrates with in situ optical reflectance monitoring of the growth. The optical bandgap was found to be 1.25-1.28 eV and an electron Hall mobility as high as 395 cm(2) V-1 s(-1) was measured. The films were n-type with carrier concentrations in the 10(18) -10(19) cm(-3) range.
- 出版日期2016-10
- 单位北京航空航天大学