Material removal mechanism of K9 glass during chemical mechanical polishing by fixed abrasive pad

作者：Fan Ji Long; Zhu Yong Wei^*; Li Jun; Ye Jian Feng

来源：Nanotechnology and Precision Engineering, 2012, 10(3): 278-283.

• Chemical functions
• Denatured layer
• Fixed abrasives
• Host materials
• K9 glass
• Material removal mechanisms
• Material removal process
• Material removal rate
• Mechanical functions
• Polishing pads
• Polishing slurries
• Research results
• Rotation speed
• Soak time
• Surface hardness
• Weight loss measurements

The mechanical and chemical functions during the material removal process are separated by adopting weight loss measurements when fixed abrasive pad works on K9 glass. The influence of polishing slurry on the surface hardness of K9 glass is also analyzed by the micro-hardness method. The research results show that the chemical reaction between polishing slurry and K9 glass will take place and form a denatured layer on the surface of K9 glass, which is softer than host material and whose thickness increases with soak time. The material removal rate of K9 glass by chemical function is very limited and the mechanical function of K9 glass is mainly by brittle removal, while the interaction of chemical and mechanical functions is the main factor in influencing the material removal rate of K9 glass. When the rotation speed of the polishing pad is 200 r/min, the chemical and mechanical functions come to a balance with their interaction being the strongest, and the material removal rate reaches its maximum.

• 出版日期2012
• 单位南京航空航天大学