Amorphous alumina thin films deposited on titanium: Interfacial chemistry and thermal oxidation barrier properties

作者：Baggetto Loic; Charvillat Cedric; Thebault Yannick; Esvan Jerome; Lafont Marie Christine; Scheid Emmanuel; Veith Gabriel M; Vahlas Constantin

来源：Physica Status Solidi A-Applications and Materials Science, 2016, 213(2): 470-480.

DOI：10.1002/pssa.201532838

• deposition
• interdiffusion
• oxygen barriers
• thin films
• Ti/Al2O3
• X‐ray photoelectron spectroscopy

Ti/Al2O3 bilayer stacks are used as model systems to investigate the role of atomic layer deposition (ALD) and chemical vapor deposition (CVD) to prepare 30–180 nm thick amorphous alumina films as protective barriers for the medium temperature oxidation (500–600 °C) of titanium...

• 出版日期2016-2