摘要

A framework combining artificial neural network (ANN) modelling technique, data mining and ant colony optimisation (ACO) algorithm is proposed for determining multiple-input multiple-output (MIMO) process parameters from the initial chemical-mechanical planarisation (CMP) processes used in semiconductor manufacturing. Owing to the invisibility of the ANN in the solution procedures, the decision tree approach of data mining is adopted to provide the necessary information for a real-valued ACO. The simulation result demonstrates that the proposed method can be an efficient tool for selecting properly defined parameter combination with the CMP process.

  • 出版日期2007