A study of the decay of atoms in chlorine plasma on aluminum films

作者:Iventichev M Yu*; Boikova I S; Sitanov D V; Svettsov V I
来源:High Energy Chemistry, 2010, 44(3): 254-257.
DOI:10.1134/S0018143910030185

摘要

The possibility of using the relaxation technique for monitoring the time dependence of the number density of chlorine atoms in a discharge in the presence of aluminum specimens was shown. The decay kinetics of chlorine atoms on aluminum was studied in detail, and it was shown that the mechanism of the decay of chlorine atoms follows the first-order rate law in their concentration. The probability of the decay of chlorine atoms on aluminum immediately in the plasma zone was experimentally measured (gamma = 9.3 x 10(-3)); its value is three times that known from the literature for the afterglow region.

  • 出版日期2010-5

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