Directed 2D-to-3D Pattern Transfer Method for Controlled Fabrication of Topologically Complex 3D Features in Silicon

作者：Rykaczewski Konrad^*; Hildreth Owen J; Wong Ching P; Fedorov Andrei G; Scott John Henry J

来源：Advanced Materials, 2011, 23(5): 659-+.

DOI：10.1002/adma.201003833

A process that allows control over the 3D motion of catalyst nanostructures during metal-assisted chemical etching by their local pinning prior to etching is demonstrated. The pinning material acts as a fulcrum for rotation of the catalyst structures resulting in etching of silicon features with rotational geometry.

• 出版日期2011-2-1