A new way of manufacturing high resolution optical encoders by nanoimprint lithography

作者：Merino S^*; Retolaza A; Juarros A; Landis S

来源：Microelectronic Engineering, 2007, 84(5-8): 848-852.

DOI：10.1016/j.mee.2007.01.024

• nanoimprint lithography
• optical encoders
• dimensional metrology

A process based on nanoimprint lithography is proposed to manufacture linear encoders with a pitch below 1 Pm. A phase scale and a read head were manufactured by pattern transfer on silicon and glass, respectively. The process developed points out that this technology may be suitable for mass produced encoders with a very high resolution and/or accuracy in the nanoscale range.

• 出版日期2007-8
• 单位中国地震局