A STUDY ON THE INFLUENCE OF THE PRIMARY ELECTRON BEAM ON NANODIMENSIONAL LAYERS ANALYSIS

作者：Miculescu F^*; Jepu I; Porosnicu C; Lungu C P; Miculescu M; Burhala B

来源：Digest Journal of Nanomaterials and Biostructures, 2011, 6(1): 307-317.

• nanolayers
• SEM
• EDS microanalysis
• Monte Carlo simulation

Nowadays scanning electron microscopy (SEM) and energy-dispersive X-ray microanalysis (EDS) are used extensively in nanotechnology and thin films realms. When assessing nanodimensional multilayer systems, by SEM and EDS, new standards of accuracy are required for the analytical data generated by the electron-matter interactions from substrate and the effective thickness of deposited ultrathin films. This study aims to investigate the effect of SEM electron beam energy on the penetration depth on Cu-Ni-Cu-Fe-Ta nanolayered structures of various thicknesses deposited onto Si (100) wafers by thermo-ionic vacuum arc, using extensive microanalytical SEM-EDS measurements and mathematical simulations based on Monte Carlo model. Relationships between the electron beam energy and penetration depth into samples are established. Elemental chemical analyses and films' thickness measurements are performed and the influence of the accelerating voltage of electron beam upon the size and shape of the interaction volume is studied and discussed accordingly.

• 出版日期2011-3