An iron(II) diketonate-diamine complex as precursor for thin film fabrication by atomic layer deposition

作者：Bratvold Jon E^*; Carraro Giorgio; Barreca Davide; Nilsen Ola

来源：Applied Surface Science, 2015, 347: 861-867.

DOI：10.1016/j.apsusc.2015.04.154

• Atomic layer deposition
• Molecular layer deposition
• Fe(hfa)(2)TMEDA
• Hybrid organic-inorganic materials

A new divalent Fe precursor has been explored for deposition of iron-containing thin films by atomic layer deposition and molecular layer deposition (ALD/MLD). The Fe(II) beta-diketonate-diamine complex, Fe(hfa)(2)TMEDA, (hfa = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionate, TMEDA=N,N,N',N'-tetramethylethylenediamine) can be handled in air, and sublimation at 60 degrees C ensures a satisfactory vaporization rate. The reactivity of the precursor does not allow for direct reaction with water as co-reactant. Nevertheless, it reacts with carboxylic acids, resulting in organic-inorganic hybrid materials, and with ozone, yielding alpha-Fe2O3. The divalent oxidation state of iron was maintained during deposition when oxalic acid was used as co-reactant, demonstrating the first preservation of Fe(II) from precursor to film during an MLD process. A self-saturating growth mode was proven by in situ quartz crystal microbalance (QCM) measurements, and the films were further characterized by grazing incidence X-ray diffraction (GIXRD), Fourier transform infrared spectroscopy (FTIR), and X-ray photoelectron spectroscopy (XPS).

• 出版日期2015-8-30