摘要

The size- and orientation-dependent uniaxial strain effects on ballistic hole transport in nanowire field-effect transistors are investigated using an sp(3)d(5)s*-based tight-binding formalism coupled with a compact electrostatics model and a semiclassical transport model. It is found that the strain-induced reduction of the valence band density of states leads to an increased ballistic hole current. This is explained by the product of a small reduction in hole density and a significant increase in the average ballistic hole velocity under uniaxial compression. While uniaxial compressive strain is beneficial for both < 110 > and < 100 > devices, the strain response of < 110 > nanowires is much larger than their < 100 > counterparts. Ultrascaled < 110 > nanowires have the highest hole drive current under both strained and unstrained conditions, despite the reduction of strain-induced ballistic hole current enhancement for narrower devices.

  • 出版日期2012-11

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