Deposition characterization of reactive magnetron sputtered aluminum nitride thin films for film bulk acoustic wave resonator

作者：Chiu Kuan Hsun^*; Chen Jiann Heng; Chenc Hong Ren; Huang Ruey Shing

来源：Thin Solid Films, 2007, 515(11): 4819-4825.

DOI：10.1016/j.tsf.2006.12.181

• aluminum nitride
• radio frequency sputter

This work studies the relationship between the deposition process parameters and the properties of sputtered c-axis-oriented aluminum nitride (AIN) thin films. AIN films were deposited on a Pt electrode by reactive magnetron sputtering under various deposition conditions. The films were characterized by X-ray diffraction (XRD) and field-emission scanning electron microscopy (FESEM). A polycrystalline AIN film with highly c-axis-preferred orientation was achieved. The XRD rocking curve was 2.7 degrees. The FESEM photographs also show that the AIN film has a dense hexagonal surface texture with uniform grain size and a highly ordered column structure.

• 出版日期2007-4-9
• 单位中国科学院电工研究所; 清华大学