ALD/MLD processes for Mn and Co based hybrid thin films

作者：Ahvenniemi E; Karppinen M

来源：Dalton Transactions, 2016, 45(26): 10730-10735.

DOI：10.1039/c6dt00851h

New types of transition metal–organic hybrid thin films are fabricated with the emerging atomic/molecular layer deposition (ALD/MLD) technique through sequential gas-surface reactions from Mn(thd)3, Co(thd)2, Co(acac)3 and terephthalic acid (1,4-benzenedicarboxylic acid) precursors.

• 出版日期2016