AFM based femto-second laser nanofabrication of PMMA

作者：Huang Wen Hao^*; Zhu Lan Fang; Chen Yu Hang; Yan Feng; Zhou Ming; Wang Xiang

来源：Optics and Precision Engineering, 2007, 15(12): 1959-1962.

• Atomic force microscope (AFM)
• Femto second laser irradiation
• Field enhancement
• Near field optical distribution
• Optical lithography
• PMMA

A new nano-process technique beyond conventional optical lithography was introduced. As the main mechanisms, field enhancement effect was discussed. Using Finite Difference Time Domain method (FDTD), the near-field optical distribution of metallic tips was simulated. Nanofabrication on PMMA surfaces using an Atomic Force Microscope (AFM) tip under femto-second laser irradiation was investigated. Various lines and letters of different widths were processed, then fabricated patterns were tested by the same AFM tip in situ. Without optimization of the laser parameters, 100 nm resolution which is better than far field fabrication of our research group (-200 nm) was obtained.

• 出版日期2007
• 单位中国科学技术大学