Atomic layer deposition of Zn1-xMgxO:Al transparent conducting films

作者：Luka G^*; Witkowski B S; Wachnicki L; Goscinski K; Jakiela R; Guziewicz E; Godlewski M; Zielony E; Bieganski P; Placzek Popko E; Lisowski W; Sobczak J W; Jablonski A

来源：Journal of Materials Science, 2014, 49(4): 1512-1518.

DOI：10.1007/s10853-013-7832-5

Aluminum-doped zinc magnesium oxide (Zn1-xMgxO:Al) films with the Mg content from x = 0 to 0.48 were obtained using atomic layer deposition (ALD). Together with the thorough studies of the properties of the deposited films, the ALD growth parameters conditioning possible applications of Zn1-xMgxO: Al films as transparent electrodes are investigated. Very low film resistivities (<= similar to 10(-3) Omega cm) and the metallic-type conductivity behavior at room temperature for Zn1-xMgxO: Al films are observed for Mg content x < 0.19. The Mg content of x = 0.19 results in the optical absorption edge of Zn1-xMgxO: Al films at 3.81 eV (325 nm). Other film parameters like work function or sheet resistance can be easily modified by variation of growth parameters.

• 出版日期2014-2