Microstructure characterization of multilayered TiSiN/CrN thin films

作者：Yang Sheng Min; Chang Yin Yu^*; Lin Dong Yih; Wang Da Yung; Wu Weite

来源：Journal of Nanoscience and Nanotechnology, 2008, 8(5): 2688-2692.

DOI：10.1166/jnn.2008.592

• TiSiN/CrN
• cathodic arc evaporation
• amorphous silicon nitride
• multilayer coating.

Monolayered TiSiN and multilayered TiSiN/CrN coatings were synthesized by a cathodic arc deposition process. The chromium and Ti/Si (80/20 at.%) alloy targets were adopted as the cathode materials, altering the ratio of cathode current (/([TiSi])/1([Cr])) to obtain various multilayer periodic thicknesses of multilayered TiSiN/CrN coatings. X-ray diffraction and TEM analyses showed that all the deposited monolayered TiSiN and multilayered TiSiN/CrN films possessed the B1-NaCl structure. In this study, it was shown that the multilayer periods (Lambda) of the TiSiN/CrN deposited at /([TiSi])//([Cr]) cathode current ratios of 1.8, 1.0, and 0.55 were 8.3 nm, 6.2 nm, and 4.2 nm, respectively, with multilayer periodic thicknesses decreasing with smaller /([TiSi])//([Cr]) cathode current ratios. An amorphous phase was found at the boundaries of the TiN/CrN column grains. In addition, the multilayered TiSiN/CrN coatings displayed a lamellar structure that was well-defined and nonplanar between each TiN and CrN layer.

• 出版日期2008-5