Advanced environmental control as a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics

作者：Yashchuk Valeriy V^*; Artemiev Nikolay A; Lacey Ian; McKinney Wayne R; Padmore Howard A

来源：Optical Engineering, 2015, 54(10): 104104.

DOI：10.1117/1.OE.54.10.104104

• x-ray optics
• optical metrology
• surface slope profilometry
• surface interferometry
• microscopy
• error reduction
• calibration

The advent of fully coherent free-electron laser and diffraction-limited synchrotron radiation storage ring sources of x-rays is catalyzing the development of new ultrahigh accuracy metrology methods. To fully exploit these sources, metrology needs to be capable of determining the figure of an optical element with sub-nanometer height accuracy. The major limiting factors of the current absolute accuracy of ex situ metrology are drift errors due to temporal instabilities of the lab's environmental conditions and systematic errors inherent to the metrology instruments. Here, we discuss in detail work at the Advanced Light Source X-Ray Optics Laboratory on building of advanced environmental control that is a key component in the development of ultrahigh accuracy ex situ metrology for x-ray optics. By a few examples, we show how the improvement of the environmental conditions in the lab allows us to significantly gain efficiency in performing ex situ metrology with high-quality x-ray mirrors. The developed concepts and approaches, included in the design of the new X-Ray Optics Laboratory, are described in detail. These data are essential for construction and successful operation of a modern metrology facility for x-ray optics, as well as high-precision measurements in many fields of experimental physics. (C) The Authors. Published by SPIE under a Creative CommonsAttribution 3.0 Unported License. Distribution or reproduction of this work in whole or in part requiresfull attribution of the original publication, including its DOI.

• 出版日期2015-10