Development of higher performance indium tin oxide films at a very low temperature (< 80 degrees C) by the neutral beam-assisted sputtering process

作者：Jang Jin Nyoung; Lee You Jong; Lee Jun Young; Jang Yun Sung; Hong MunPyo^*; Oh Kyoung Suk; Yoo Suk Jae; Kim Daechul; Lee Bonju; Jang Won Gun

来源：Thin Solid Films, 2011, 519(7): 2098-2102.

DOI：10.1016/j.tsf.2010.10.041

• Neutral beam assisted deposition
• Indium tin oxide
• Low temperature deposition
• Sputtering
• Nano crystalline

At very low temperatures (<80 degrees C), improved performance indium tin oxide (ITO) thin films with a low resistivity of 4.22 x 10(-4) Omega cm and high transmittance >90% at 550 nm were developed using the neutral beam-assisted sputtering (NBAS) technique, which included a cyclic inter-treatment process with an Ar neutral beam. Transmission electron microscopy and electron diffraction showed that the neutral particles with hyper-thermal energy was able to enhance the formation of the nano-crystalline phase and activate the dopant without additional heating or plasma damage during ITO thin film deposition.

• 出版日期2011-1-31