(100) GaAs surface treatment prior to contact metal deposition in AlGaAs/GaAs quantum cascade laser processing

作者：Papis Ewa^*; Baranska Anna; Karbownik Piotr; Szerling Anna; Wojcik Jedlinska Anna; Bugajski Maciej; Rzodkiewicz Witold; Szade Jacek; Wawro Andrzej

来源：Optica Applicata, 2009, 39(4): 787-797.

DOI：100) GaAs surface properties with the aim to develop the procedure of surface preparation before met

• GaAs
• surface treatment
• sputter etching

The effects of HCl-based chemical and Ar(+) sputter etching treatment on (100) GaAs surface properties with the aim to develop the procedure of surface preparation before metal deposition have been investigated. Variable angle spectroscopic ellipsometry, X-ray photoelectron spectroscopy, atomic force microscopy and photoluminescence have been used to study the surface characterization. We show that combining chemical etching in 5% HCl with Ar(+) sputter etching gives the best results for surface cleaning prior to metal deposition.

• 出版日期2009