A novel acrylic prepolymer/methacrylate modified nano-SiO2 composite used for negative photoresist

作者：Yuan, Yan^*; Chen, Ning; Liu, Ren; Zhang, Shengwen; Liu, Xiaoya

来源：Materials Research Bulletin, 2014, 50: 392-398.

DOI：10.1016/j.materresbull.2013.11.024

• Composites
• Electronic materials
• Chemical synthesis

A novel nanocomposite consisting of methacrylate modified nano-SiO2 (SiO(2)MA) and acrylic prepolymer (G-ACP) was found a potential candidate as a negative photoresist. The SiO(2)MA was synthesized from glycidyl methacrylate (GMA), 3-aminpropyltriethoxysilane (KH550) and a pre-synthesized nano-SiO2 through the sol-gel process. G-ACP was synthesized through radical polymerization of five monomers, followed by grafting with carboxyl and methacrylate group. The molecular structures of monomers and polymers were characterized by FT-IR and H-1 NMR spectroscopy. Finally, SiO2MA was added into G-ACP in different contents and treated with a standard thermal and UV-exposure process to obtain a series of cured organic-inorganic nanocomposite photoresists. The formed nanocomposite photoresists exhibited improved photosensitivity and had a low D-n(0.5) of 26.8 mJ cm(-2) with 13.7 wt% SiO2MA. Moreover, the thermal and mechanical properties also showed great enhancement while all of the photoresists had a nice line pattern of less than 25 mu m.

• 出版日期2014-2
• 单位江南大学