Nonchemically amplified resists possessing cholate moiety for micropatterning of biomolecules

作者：Ganesan Ramakrishnan; Kim Jin Baek^*

来源：Microelectronic Engineering, 2011, 88(1): 93-98.

DOI：10.1016/j.mee.2010.09.002

• Lithography
• Deep UV
• Photoresists
• Diazoketo
• Biomolecular patterning

Two novel monomers, containing diazoketo functional groups, cholic acid 3-diazo-3-ethoxycarbonyl-2-oxo-propyl ester methacrylate (CDEOPE-MA) and 2-diazo-6-hydroxy-3-oxo-hexanoic acid ethyl ester methacrylate (DHOHEE-MA), were designed and synthesized for biomolecular patterning applications. The polymers were synthesized by radical copolymerization of CDEOPE-MA, DHOHEE-MA, and gamma-butyrolacton-2-yl methacrylate. The patternability of the synthesized photoresist polymers were characterized by their lithographic evaluation. Introduction of cholate-monomer (CDEOPE-MA) seems to enhance the film formability as well as film stability in aqueous medium. DNA oligonucleotide patterning study was performed to demonstrate the applicability of this system for biomolecular patterning.

• 出版日期2011-1