Monitoring of N-2 and NH3 Plasmas Using Digital In-Line Holography

作者:Kim Byunghwhan*; Jung Donghwa; Seo Junhyun; Lee Jukong; Jung Jinsoo
来源:Journal of Nanoelectronics and Optoelectronics, 2016, 11(1): 103-107.
DOI:10.1166/jno.2016.1876

摘要

Plasmas play a crucial role in fabricating various nano electronic devices. They have been monitored typically by the in-situ sensors such as optical emission spectroscopy (OES) and Langmuir probe. As an alternative, a digital in-line holography (DIH) relying only upon an object beam has demonstrated strong correlations with the current plasma sensors in data tendency. In this work, the performance of DIH was evaluated in N-2 and NH3 plasmas as a function of the gas flow rate. In N-2 plasma, the tendency of the pixel sum variations extracted from laser holograms were exactly identical to the one obtained from OES. Moreover, another tendency of pixel sum was very similar to the one of ion flux measured by Langmuir probe. This was similarly observed in NH3 plasma. The confirmed correlations indicate that DIH can provide both optical and electric data simultaneously. This was attributed to the new properties of light experimentally proved. It was confirmed that light itself is matter composed of positive particles emitted from atom. The positive light played a key role in creating an electronmagnetic field prior to the flow of plasma matter and particles. A series of experimental works related to light matter were stated.

  • 出版日期2016-2