Size distribution and visible luminescence of silicon nanoparticles embedded in SiNx thin film: Role of RF power in PECVD

作者：Andres Gomez Gonzalez Luis; Dutt Ateet; Marel Monroy Betsabee; David Escobar Carrasquilla Juan; Santana Guillermo^*; Alvarez Macias Carlos; Ponce Arturo

来源：Functional Materials Letters, 2017, 10(3): 1750014.

DOI：10.1142/S179360471750014X

• Chemical vapor deposition
• nanoparticles
• electron microscopy
• photoluminescence
• FTIR

This paper presents, the studies of the influence of (radio frequency) RF power on the size distribution and visible photoluminescence (PL) of SiNx thin film deposited at 300 degrees C of substrate temperature by plasma enhanced chemical vapor deposition. RF power was varied (5-50 W), and its aftereffect on the optical properties of thin films was investigated. By increasing the RF power between 5 W and 25 W, main PL peak showed a red shift with an increase in PL intensity, which is associated with an increase in the silicon nanocrystals size and density, respectively. Results obtained were confirmed with High-resolution transmission electron microscopy micrographs and from the statistical calculations. By attaining a precise RF power value, stable silicon nitride thin film with suitable optical properties can be achieved for the potential fabrication of optoelectronic devices.

• 出版日期2017-6