摘要

We report a process for inkjet printing electrically continuous micron-wide lines of silver nanoparticles by exploiting edge-enhanced evaporation commonly associated with the coffee-stain effect. In situ and real-time flow observation confirmed preferential nanoparticle deposition at the contact line of printed rivulets. The resulting twin-pair of parallel continuous lines showed characteristic width (2-8 mu m), height (100-300 nm), and pair spacing (100-600 mu m) that depended on substrate and printing conditions in a theoretically predictable way. Thermally sintered lines were used to form rectilinear grids showing similar to 5 Omega/square effective sheet resistance. The robustness of the deposition process was investigated, and line pathologies were found to depend on substrate surface wettability.

  • 出版日期2013-5-27