摘要

The microscopic surface morphology of "lifted-off" surfaces, produced via ion implantation was observed by atomic force microscopy. A polished single-crystal diamond substrate with an average surface roughness of less than 0.1 nm was used for precise observations. After the lift-off process, the lifted-off surface became rough with pits appearing. Hydrogen plasma treatment close to the chemical vapor deposition conditions for diamond (1150 degrees C, 160 Torr) completely removed these pits and the surface was subsequently covered by a strip-like structure consisting of atomic steps. The surface roughness, however, was not further influenced by the plasma treatment. The observed morphological evolution reflects the graphite/diamond interface formed by the lift-off.

  • 出版日期2013-1