Microstructure characteristic of Cr-doped carbon film with gradient transition layer

作者：Zhang Yong Hong^*; Jiang Bai Ling; Chen Di Chun; Yan Shao Ping

来源：Materials Science and Technology, 2010, 18(1): 83-88.

• Bottom layers
• Carbon rich
• Columnar crystals
• Cr content
• Cr-doped
• Crystal phasis
• Crystal planes
• Deposition technique
• Film-forming
• Growth directions
• Lamellar crystals
• matrix
• Metallic chromium
• Microstructure characteristics
• Nano-multilayer film
• Nanocrystallines
• Preferred orientations
• Si wafer
• Transition layers
• Unbalanced magnetron

In order to reveal how two main film forming elements, C and Cr, exist and distribute in amorphous carbon film, Cr-doped carbon film with gradient transition layer was prepared by unbalanced magnetron sputter ion plating deposition technique. High resolution transmission electron microscopy (HRTEM) was utilized to characterize the film's microstructure. The observational results show that Cr bottom layer deposited on Si wafer is typical columnar crystal, upon which the gradient transition layer consisting of various morphologies Cr nanocrystalline and carbon-rich noncrystalline matrix exists. These Cr nanocrystallines in the transition layer form in sequence lamellar crystal, island-like crystal and microcrystal along the film's growth direction with decreasing Cr content. Working layer of the Cr-doped carbon film is a noncrystalline nano-multilayer film. C in the film always exists in the form of amorphous carbon, and all crystal phases found in the film belong to metallic chromium. Furthermore, both Cr columnar crystal and various morphologies Cr nanocrystalline in the transition layer exhibit more or less preferred orientation of (110) crystal plane.

• 出版日期2010