A mechanism of changes in the electron work function upon water chemisorption on a Si(100) surface

作者:Novikov S N*; Timoshenkov S P
来源:Russian Journal of Physical Chemistry, 2010, 84(7): 1266-1269.
DOI:10.1134/S0036024410070332

摘要

Based on an analysis of observed changes, experimentally obtained by the methods of thermal and radiation processing, in the electron work EWF) of a monocrystalline silicon (100) surface upon water chemisorption, a physical mechanism associated with the concept of the energy action of the coherent phase of sorbed water on a surface is proposed for the decrease and increase in the EWF.

  • 出版日期2010-7