Deposition of zinc oxide thin films by reactive pulsed laser ablation

作者：Bilkova P; Zemek J; Mitu B; Marotta V; Orlando S^*

来源：Applied Surface Science, 2006, 252(13): 4604-4609.

DOI：10.1016/j.apsusc.2005.07.088

• reactive pulsed laser deposition
• zinc oxide
• thin films

Thin films of zinc oxide have been deposited by reactive pulsed laser ablation of Zn and ZnO targets in presence of a radio frequency (RF) generated oxygen plasma. The gaseous species have been deposited at several substrate temperatures, using the on-axis configuration, on Si (1 0 0). Thin films have been characterized by scanning electron microscopy, atomic force microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and infrared spectroscopy. A comparison among conventional PLD and reactive RF plasma-assisted PLD has been performed.

• 出版日期2006-4-30