Analysis of the Performance of C-Shaped Armature With Resistivity Gradient

作者:Xiao Zheng; He Junjia*; Xia Shengguo; Chen Lixue
来源:IEEE Transactions on Magnetics, 2009, 45(1): 510-513.
DOI:10.1109/TMAG.2008.2008878

摘要

The feasibility and the performance of the armature with resistivity gradient were studied. The current distribution and its improvement by resistance distribution adjustment in C-shaped armature were analyzed by finite-element method. The calculation was performed with a monolithic armature, in which we defined several layers arranged of two different types. With some adjustment of resistivity of the layers, the current density distribution was found more appropriate for EML. The armature of type-I seems more considerable than that of type-II, as it is more sensitive to resistance changes, and the maximum current density appears in head part of the armature instead of corner, which reduces the possibility of armature corner rupture in electromagnetic launch.